Platinum Metals Rev., 2002, 46, (3), 107
Platinum Coatings in Memory Capacitors
The production of a Pt film which has continuous smoothness and good step coverage, useful in capacitors, such as container capacitors for memory Cells, is described in a patent by E. P. Marsh of Micron Technology Inc. (U.S. Patent 6,387,802). The Pt film is deposited by CVD from a Pt-based organic precursor in an inert carrier gas onto a substrate, such as TiN, which coats a silicon substrate. Ultraviolet light is used to decompose the precursor during or following the CVD. The film finally undergoes low-temperature annealing in oxygen to avoid metal silicide formation.